Multilayer X-ray optics design and development involves the creation of advanced optical elements that utilize thin films of alternating high and low atomic number materials to reflect and manipulate X-rays. These multilayer optics are crucial for various X-ray imaging and spectroscopy applications, including medical imaging, materials science, and astronomical observations. The design of multilayer X-ray optics involves simulations and optimization of the film thickness and material properties to achieve the desired reflectivity and performance. The development of these optics requires precise fabrication techniques, such as molecular beam epitaxy or sputtering, to create thin film layers with high uniformity and accuracy. The resulting multilayer X-ray optics have the potential to greatly enhance the capabilities of X-ray systems and enable new scientific discoveries.